Launching 2026

Precision at
13.5 Nanometers

Independent EUV metrology services for the semiconductor industry. We test at the actual wavelength so your components perform exactly as designed.

13.5nm EUV Wavelength
48hr Target Turnaround
100% Confidential
The Gap

The Industry Has
a Testing Problem

As EUV lithography becomes the backbone of advanced chipmaking, every material and component must be validated under real 13.5nm light. But access to that light is nearly impossible.

Almost Zero Access Globally

There are very few facilities worldwide that can test under real EUV light, and the ones that exist are either government-run, overbooked, or closed to commercial customers.

$370M Machines, Untested Parts

High-NA EUV scanners are the most expensive machines ever made. Every component going near them must be EUV-qualified, but testing access doesn’t exist.

3-6 Month Wait Times

National labs operate on academic timelines. Companies in the EUV supply chain need results in days, not months.

The Solution

Metrology as
a Service

Actinic Labs provides commercial-grade EUV testing with the speed, confidentiality, and flexibility the semiconductor industry demands.

01

Real EUV Light

Built around the Energetiq EQ-10, a pulsed DPP source delivering up to 20W of in-band EUV at 13.5nm. Industry-relevant conditions, not synchrotron approximations.

02

Fast Turnaround

Standard results in 2-4 weeks. Rush service available. That’s 10x faster than national labs and government research facilities.

03

Full Confidentiality

Your NDA. Your data. Period. No FOIA risk, no shared consortium data, no public disclosure. Complete IP protection for every engagement.

04

Pay Per Test

No membership fees. No consortium buy-in. Commercial flexibility that lets companies of any size access EUV testing on demand.

Who We Serve

Built for the
EUV Ecosystem

OEM

Scanner & Tool OEMs

Component qualification, sensor calibration, and material testing for next-gen lithography platforms.

MAT

Material Suppliers

EUV compatibility testing for adhesives, lubricants, coatings, and specialty materials entering the supply chain.

FAB

Fabs & IDMs

Resist evaluation, mask-related metrology, and process characterization under real actinic conditions.

R&D

Research Institutions

Fast-track access to EUV light for academic and government research programs without synchrotron wait times.

Ready to Connect

Let’s Shape the Future of
EUV Metrology

Whether you’re exploring partnerships, investment opportunities, or need precision metrology for your next-gen program.

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